Rapid thermal processing (RTP) is a semiconductor manufacturing technique in which wafers are exposed to very high temperatures for a short duration, typically a few seconds to a few minutes. This method allows precise control of thermal cycles, minimizing unwanted diffusion effects.
RTP is commonly used for processes such as dopant activation, oxidation, and annealing, where uniform heating and quick ramp-up and cool-down times are essential. By limiting exposure, RTP helps maintain the integrity of delicate device structures while achieving the desired material modifications.
This process is critical in advanced semiconductor fabrication, where speed, precision, and repeatability directly impact device performance.