Dopant activation is a key process in semiconductor manufacturing that ensures dopants, or intentionally added impurities, become electrically active within the material. This step is essential for modifying the electrical properties of semiconductors like silicon.
The process is typically achieved through controlled heating, which enables dopant atoms to move into proper lattice positions within the crystal structure. Once activated, these dopants can effectively enhance conductivity or alter the behavior of the semiconductor as designed.
Dopant activation is critical in producing high-performance electronic devices, including transistors, diodes, and integrated circuits, where precise electrical characteristics are required.