SH Scientific’s vacuum muffle furnaces are engineered for precise, controlled thermal processing under vacuum or inert atmospheres. Designed for applications such as annealing, sintering, vacuum brazing, and degassing, they minimize contamination by eliminating oxygen exposure and enabling complete inert gas saturation.
Compared to traditional tube furnaces, these units support a wider range of sample shapes and sizes—ideal for larger or irregular materials. They also allow multiple atmospheres within the same chamber, offering exceptional flexibility for diverse heat treatment requirements.
Performance by High Vacuum Pump Configuration:
- 10⁻¹ to 10⁻² Torr with SH-V60
- 10⁻³ to 10⁻⁴ Torr with SH-HV40
- 10⁻⁴ to 10⁻⁵ Torr with SH-HV40T
All models are benchtop furnaces with chamber volumes from 1.5 L to 31 L and temperature ratings between 1200°C and 1500°C—suitable for both compact laboratory environments and demanding industrial applications.
These furnaces also serve as proven platforms for graphene growth via CVD on metal substrates (e.g., copper)—often referred to as CVD vacuum furnaces.
For optimal oxidation control, we recommend adding a mass flow controller and back pressure regulator. An optional low-noise vacuum pump is also available to create a quieter, more focused lab environment.
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